Keevalid™ Depth Slurry Polishing Filter
Removal Rating: 0.05μm-11μm
CMP Polishing Slurry Filtration Solution
Suitable for CMP polishing system in the slurry recirculation / global loop and at point-of-use (POU).
Accurate Retention Efficiency
Remove defective particles while allowing effective particles to pass through.
Nano-fiber Media
Multi-layer Nano-fiber media provides high flow rates and dirt holding capacity.
One-piece Construction
One-piece construction means it’s easy to install, clean, and replace.
Strict Japanese quality assurance to ensure product stability.
Graded Pore Structure
Effectively removes defective particles and high dirt holding capacity.