Keevalid Depth Slurry Polishing Filter
CMP Polishing Slurry Filtration Solution


Keevalid™ Depth Slurry Polishing Filter  

Removal Rating: 0.05μm-11μm

Keevalid Depth Slurry Polishing Filter


CMP Polishing Slurry Filtration Solution


Suitable for CMP polishing system in the slurry recirculation / global loop and at point-of-use (POU).


Accurate Retention Efficiency

Remove defective particles while allowing effective particles to pass through.

Accurate Retention Efficiency


Nano-fiber Media

Multi-layer Nano-fiber media provides high flow rates and dirt holding capacity.


Nano-ber Media


One-piece Construction

One-piece construction means it’s easy to install, clean, and replace.


Strict Japanese quality assurance to ensure product stability.


Graded Pore Structure

Effectively removes defective particles and high dirt holding capacity.


Graded Pore Structure



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