Provalid™ Patented Construction Filter

Removal Rating: 0.05μm-5.0μm

CMP Polishing Slurry Filtration Solution

Suitable for CMP polishing system in the slurry recirculation / global loop and at point-of-use (POU).

Accurate Retention Efficiency

Remove defective particles while allowing effective particles to pass through.

Nano-fiber Media

Multi-layer Nano-fiber media provides high flow rates and dirt holding capacity.

One-piece Construction

One-piece construction means it’s easy to install, clean, and replace.

Strict Japanese quality assurance to ensure product stability.

Graded Pore Structure

Effectively removes defective particles and high dirt holding capacity.

Patent on Filter Construction Design

Perfectly integrate depth, pleated and rolled technologies in filter design