CMP Polishing Slurry Filtration Solution
Accurate Retention Efficiency Remove defective particles while allowing effective particles to pass through Nano-fiber Media Multi-layer Nano-fiber media provides high flow rates One-piece Construction One-piece construction means it's easy to install, clean, | Strict Japanese quality assurance to ensure product stability Graded Pore Structure Effectively removes defective particles and high Patent on Filter Construction Design Perfectly integrate depth, pleated and rolled |
Keevalid™ | 0.05μm-11μm | |
Privalid™ | 0.1μm-1.5μm | |
Provalid™ | 0.05μm-5.0μm |