Photopex UPE2nm removal retention. Using dense membrane technology, to effectively remove easy-deformable contaminant.
Photopex™ Nylon Ultra-high Efficiency Filter5nm removal retention.
Using asymmetric membrane technology, to achieve higher flow rate and improve production operability.
Using high purity PE structure and apply the ultra-clean technology to ensure filter's cleanliness.
Photopex MultiAccording to different application requirements, use Cobetter's know-how and experience to customize the product.
Photogile POU Filter for Lithography ProcessOne-piece construction is easy to install, clean and replace this
filter capsule
