Novacise® Series are used to dilute acids, bases and other process chemicals as a cost-effective alternative for wet etch and clean applications.
The asymmetric PES membrane provides significant characteristics including high flow rates, high dirt holding capacity, and longer filter lifetime. In addition, the membrane structure reduces bubbles formation during flow.
Cobetter Novacise Filters have efficient particle retention and low metal extractables properties.In addition,these cartridges have high mechanical strength and are suitable for a wide variety of filtration processes.
Application
Process: Wet Etch and Cleans
Installation Point: Point of Tool
Chemistry: Dilute acids (such as BOE/DHF/SC2); Dilute bases (such as SC1/TMAH); DIW
Feature
Very high flow rates and longer life.
Low extractables.
Reduces equipment pre-operation time.
Excellent retention;
Manufactured in a cleanroom environment.
100% integrity tested
Membrane | High asymmetric polyethersulfone | |||
Supports/Cage/Core/End Caps | Polypropylene (PP) | |||
O-ring | TEV or EPDM | |||
Shell(Compact Capsule) | Polypropylene (PP) | |||
Shell(Disposable ) | PFA | |||
Filter Areas | X1 (Φ68mm):0.8m2/10" Z1(Φ83mm):1.4m2/10" | |||
Max. Operating Temperature | 90°C (194°F) | |||
Max. Operating Pressure | 0.49 MPa (4.9 bar, 71.07psi) @ 25°C (77°F) 0.34 MPa (3.4 bar, 49.31psi) @ 70°C (158°F) |
Ordering Information
Cartridge
NVC | Z1 | 1 | TOC | 2 | 3 | 4 | 5 |
Block 1 | Block 2 | Block 3 | Block 4 | Block 5 |
Removal Ratings | Nominal Length | O-ring Material | Cleanliness | Package |
NM10=10nm | 10E=10" | P=TEV | M=<25 μg/device 5/10/20/30/50nm | D=Dry |
NM20=20nm | 20E=20" | E=EPDM | H=<40 μg/device 50nm/0.1um | W=Prewet, UPW |
NM30=30nm | E= Electronic grade 50nm/0.1um | WH=Prewet, UPW+1% H2O2 | ||
NM50=50nm |
NVC | X1 | 1 | TOC | 2 | 3 | 4 | 5 |
Block 1 | Block 2 | Block 3 | Block 4 | Block 5 |
Removal Ratings | Nominal Length | O-ring Material | Cleanliness | Package |
NM10=10nm | 10=10" | P=TEV | M=<25 μg/device 5/10/20/30/50nm | D=Dry |
NM20=20nm | 20=20" | E=EPDM | H=<40 μg/device 50nm/0.1μm | W=Prewet, UPW |
NM30=30nm | 30=30" | E= Electronic grade 50nm/0.1μm | WH=Prewet, UPW+1% H2O2 | |
NM50=50nm | ||||
0010=0.1μm |
Compact Capsule
NVC | 1 | 2 | 3 | 4 |
Block 1 | Block 2 | Block 3 | Block 4 | ||
Removal Ratings | Fitting Type | Inlet/Outlet | O-ring Material | Cleanliness | Package |
NM05=5nm NM10=10nm NM20=20nm NM30=30nm NM50=50nm 0010=0.1μm | BFL64-4 =CFL BFL64-10 =CFL BFL64-20 =CFL FL64 =CFL NPT42 =NPT NPT742 =NPT NPT942 =NPT SW43 =SW SW743 =SW SW943 =SW SW44 =SW SW744 =SW SW944 =SW SW84 =SW SW784 =SW SW984 =SW SW764 =SW | 3/8" 3/8" 3/8" 3/8" 1/4" 1/4" 1/4" 1/4" 1/4" 1/4" 1/4" 1/4" 1/4" 1/2" 1/2" 1/2" 3/8" | 1/4" 1/4" 1/4" 1/4" 1/8" 1/8" 1/8" 4mm 4mm 4mm 1/4" 1/4" 1/4" 1/4" 1/4" 1/4" 1/4" | M=<25 μg/device (5/10/20/30/50nm) H=<40 μg/device (50nm/0.1μm) E= Electronic grade (50nm/0.1μm) | D=Dry W=Prewet, UPW |